Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication

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Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 50(3), 03CB10-03CB10, 2011-03-22

    IOP Publishing

Codes

  • NII Article ID (NAID)
    210000070175
  • ISSN
    0021-4922
  • Data Source
    Crossref 
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