Fabrication of infrared wire-grid polarizer by sol–gel method and soft imprint lithography

• Itsunari Yamada

• Yoshiro Ishihara

Abstract

An infrared wire-grid polarizer was fabricated by forming a subwavelength grating of zirconia by imprinting techniques, a sol–gel method, and Al shadow thermal evaporation. After imprinting on a dropped zirconia nanoparticle dispersion using a silicone mold, 100-nm-thick Al was deposited on the fabricated zirconia grating with 400 nm period by evaporation. The extinction ratio of the fabricated element was 27.5 dB at 5.4 µm wavelength. The TM polarization transmittance was higher than that of the Si plate in the 4.2–5.3 µm wavelength range because the zirconia film acted as an antireflection film.

Journal

• Applied Physics Express

  Applied Physics Express 9 (5), 052202-, 2016-04-01

  IOP Publishing

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1360003449884539008
• NII Article ID: 210000137882
• DOI: 10.7567/apex.9.052202
• ISSN: 18820786
• ISSN: 18820778
• Web Site: http://stacks.iop.org/1882-0786/9/i=5/a=052202/pdf
• Web Site: http://stacks.iop.org/1882-0786/9/i=5/a=052202?key=crossref.b0f14d861249506b4c06c7f1c69fdc0c
• Web Site: https://iopscience.iop.org/article/10.7567/APEX.9.052202
• Web Site: https://iopscience.iop.org/article/10.7567/APEX.9.052202/pdf
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