Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

• Satoshi Takei

• Makoto Hanabata

抄録

This study aimed to expand the resolution limits of epoxy novolac resins that have enhanced etch resistance as one of the desirable resist properties for next-generation devices. Epoxy novolac resins have high etch resistance. However, because epoxy novolac resins are either solid or semisolid at room temperature, and because the use of volatile solvents in resist can be a cause of pattern failure in nanoimprint lithography, epoxy novolac resins have been of limited utility as resist. Excellent sub-70 nm resolution patterning can be achieved by diluting 15 wt % acetone in an ultraviolet nanoimprint lithography using gas-permeable templates.

収録刊行物

• Applied Physics Express

  Applied Physics Express 9 (5), 056501-, 2016-04-15

  IOP Publishing

キーワード

• General Physics and Astronomy
• General Engineering

詳細情報

• CRID: 1360847874814688128
• NII論文ID: 210000137909
• DOI: 10.7567/apex.9.056501
• ISSN: 18820786
• ISSN: 18820778
• ISSN: http://id.crossref.org/issn/18820786
• Web Site: http://stacks.iop.org/1882-0786/9/i=5/a=056501/pdf
• Web Site: http://stacks.iop.org/1882-0786/9/i=5/a=056501?key=crossref.f2962516c8f276c0e6d8b1dcc237ae3a
• Web Site: https://iopscience.iop.org/article/10.7567/APEX.9.056501
• Web Site: https://iopscience.iop.org/article/10.7567/APEX.9.056501/pdf
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