Nanometer-Scale Deposition of Metal Plating Using a Nanopipette Probe in Liquid Condition
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Abstract
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We describe a novel technique of a local metal plating using an atomic force microscope (AFM) with a nanopipette probe in liquid condition. A glass nanopipette, filled with CuSO4 electrolyte solution, was used as the AFM probe. An electrode wire inside the electrolyte-filled nanopipette and the conductive surface of a Au-sputtered glass slide were employed as the anode and the cathode, respectively. To avoid drying of the nanopipette solution and clogging of the probe-edge aperture, the edge of the nanopipette was immersed in the same electrolyte solution in a liquid cell placed on the Au substrate. As for controlling the distance between the probe edge and the surface in the liquid, the nanopipette probe glued on a tuning fork quartz crystal resonator was vertically oscillated to use a method of frequency modulation in tapping-mode. By utilizing the probe–surface distance control during the deposition, nanometer-scale Cu dots were successfully deposited on the Au surfaces without diffusion of the deposition even in the liquid condition. This technique of local deposition in a liquid would be applicable for various fields such as the fabrication of micro/nanometer-scale devices and the arrangement of biological samples.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 50 (8), 08LB15-, 2011-08-22
Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1050001338868580608
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- NII Article ID
- 210000139522
- 120003368387
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- NII Book ID
- AA12295836
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- ISSN
- 00214922
- 13474065
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- HANDLE
- 10297/6167
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- NDL BIB ID
- 11211489
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- Text Lang
- en
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- Article Type
- journal article
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- Data Source
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- IRDB
- NDL
- Crossref
- CiNii Articles
- KAKEN