Improvement in Film Quality of Epitaxial Graphene on SiC(111)/Si(111) by SiH₄Pretreatment

• Shota Sanbonsuge

• Shunsuke Abe

• Hiroyuki Handa

• Ryota Takahashi

• Kei Imaizumi

• Hirokazu Fukidome

• Maki Suemitsu

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 51 (6S), 06FD10-, 2012-06-01

  IOP Publishing

キーワード

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

詳細情報

• CRID: 1360003449885720320
• NII論文ID: 210000140726
• DOI: 10.7567/jjap.51.06fd10
• ISSN: 13474065
• ISSN: 00214922
• データソース種別:
  • Crossref
  • CiNii Articles