Technology Evolution for Silicon Nanoelectronics: Postscaling Technology

• Shigeaki Zaima

抄録

Si ultralarge-scale integration (ULSI) circuits have been developed by downscaling device dimensions on the basis of the concept of scaling, following Moore's law. However, continued downscaling in future ULSI devices will become more difficult because of an increase in the number of technological and economic problems. Therefore, it is necessary to establish a new direction of technological development different from that based on downscaling. In this review, a technology that realizes devices with high performance, integration, and functionality independently of downscaling, is referred to as a postscaling technology, and the current status and future perspectives of postscaling technology are briefly summarized and discussed.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 52 (3R), 030001-, 2013-03-01

  IOP Publishing

キーワード

• General Physics and Astronomy
• General Engineering

詳細情報

• CRID: 1360565171312526848
• NII論文ID: 210000141853
• DOI: 10.7567/jjap.52.030001
• ISSN: 13474065
• ISSN: 00214922
• ISSN: http://id.crossref.org/issn/13474065
• ISSN: http://id.crossref.org/issn/00214922
• Web Site: https://iopscience.iop.org/article/10.7567/JJAP.52.030001
• Web Site: https://iopscience.iop.org/article/10.7567/JJAP.52.030001/pdf
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