Reactions of surface hydrogen on amorphous carbon films with hydrogen plasma

• Masanori Shinohara

• Taka-aki Kawakami

• Ko-jiro Hara

• Shohei Yagi

• Yoshinobu Matsuda

• Hiroshi Fujiyama

Abstract

Reactions of surface hydrocarbon components exposed to hydrogen plasma at a substrate temperature of 200 °C were investigated by in-situ infrared spectroscopy, and changes in film thickness were measured. Both the concentration of hydrocarbon components and film thickness decreased because of the hydrogen plasma exposure. The decrease in the former was larger than that in the latter. These results indicate that the abstraction effect of surface hydrogen, as well as the etching effect, was enhanced at 200 °C.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 53 (1), 010204-, 2013-12-18

  IOP Publishing

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1360003449888372992
• NII Article ID: 210000143216
• DOI: 10.7567/jjap.53.010204
• ISSN: 13474065
• ISSN: 00214922
• ISSN: http://id.crossref.org/issn/13474065
• Web Site: https://iopscience.iop.org/article/10.7567/JJAP.53.010204
• Web Site: https://iopscience.iop.org/article/10.7567/JJAP.53.010204/pdf
• Data Source:
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  • CiNii Articles
  • KAKEN