Fabrication of 120-nm-channel-length ferroelectric-gate thin-film transistor by nanoimprint lithography

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Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 53(2S), 02BC14-02BC14, 2014-01-29

    IOP Publishing

Codes

  • NII Article ID (NAID)
    210000143362
  • ISSN
    0021-4922
  • Data Source
    Crossref 
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