Progress in theoretical approach to InGaN and InN epitaxy: In incorporation efficiency and structural stability

Access this Article

Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 53(10), 100202-100202, 2014-09-03

    IOP Publishing

Codes

  • NII Article ID (NAID)
    210000144512
  • ISSN
    0021-4922
  • Data Source
    Crossref 
Page Top