In situ monitoring of silicon nanocrystal formation with pulsed SiH₄supply by optical emission spectroscopy of Ar plasma

• Kazufumi Ikemoto

• Yoshifumi Nakamine

• Yukio Kawano

• Shunri Oda

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 53 (11), 116102-, 2014-10-23

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360284924866405376
• NII Article ID: 210000144593
• DOI: 10.7567/jjap.53.116102
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/53/i=11/a=116102/pdf
• Web Site: http://stacks.iop.org/1347-4065/53/i=11/a=116102?key=crossref.a0afaf53131393ae23db467dbbdae70d
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN