Expansion of lattice constants of aluminum nitride thin film prepared on sapphire substrate by ECR plasma sputtering method

• Satoru Kaneko

• Hironori Torii

• Takao Amazawa

• Takeshi Ito

• Manabu Yasui

• Masahito Kurouchi

• Akinori Fukushima

• Takashi Tokumasu

• Seughwan Lee

• Sungkyun Park

• Hirofumi Takikawa

• Mamoru Yoshimoto

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 53 (11S), 11RA11-, 2014-10-24

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360003449889707264
• NII Article ID: 210000144625
• DOI: 10.7567/jjap.53.11ra11
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/53/i=11S/a=11RA11/pdf
• Web Site: http://stacks.iop.org/1347-4065/53/i=11S/a=11RA11?key=crossref.dab5091ac5ed46fcbbf1abaa86feffe0
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN