Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity

• Hiroyasu Takei

• Keinosuke Yoshinaga

• Satoshi Matsuyama

• Kazuto Yamauchi

• Yasuhisa Sano

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 54 (1S), 01AE03-, 2014-11-13

  IOP Publishing

キーワード

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

詳細情報

• CRID: 1360566399843173248
• NII論文ID: 210000144748
• DOI: 10.7567/jjap.54.01ae03
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/54/i=1S/a=01AE03/pdf
• Web Site: http://stacks.iop.org/1347-4065/54/i=1S/a=01AE03?key=crossref.7a843f4f441d92a0a6e80f10ef9bc029
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