Characterization of hydrogen environment anisotropic thermal etching and application to GaN nanostructure fabrication
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 54 (4), 046501-, 2015-03-18
IOP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360847874819965696
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- NII論文ID
- 210000144936
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- ISSN
- 13474065
- 00214922
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- データソース種別
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- Crossref
- CiNii Articles
- KAKEN