Low-temperature formation of amorphous InGaZnO<i>_x</i>films with inductively coupled plasma-enhanced reactive sputter deposition

• Kosuke Takenaka

• Ken Cho

• Yasufumi Ohchi

• Hirofumi Otani

• Giichiro Uchida

• Yuichi Setsuhara

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 54 (6S2), 06GC02-, 2015-05-28

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360283696336073216
• NII Article ID: 210000145321
• DOI: 10.7567/jjap.54.06gc02
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/54/i=6S2/a=06GC02/pdf
• Web Site: http://stacks.iop.org/1347-4065/54/i=6S2/a=06GC02?key=crossref.a583e01cb653151e390a0372e001efe5
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN