Difference in etching between Si(111) and (001) surfaces induced by atomic hydrogen irradiation observed by noncontact atomic force microscopy

• Tomoaki Miyagi

• Akira Sasahara

• Masahiko Tomitori

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 54 (8S2), 08LB08-, 2015-07-24

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360284924866844672
• NII Article ID: 210000145637
• DOI: 10.7567/jjap.54.08lb08
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/54/i=8S2/a=08LB08/pdf
• Web Site: http://stacks.iop.org/1347-4065/54/i=8S2/a=08LB08?key=crossref.785587952c6ec82794c23b46f4f80883
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN