Effects of sputtering gas pressure on physical properties of ferroelectric (Bi<sub>3.25</sub>Nd<sub>0.65</sub>Eu<sub>0.10</sub>)Ti<sub>3</sub>O<sub>12</sub>nanoplate films
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 54 (10S), 10NA01-, 2015-08-27
IOP Publishing
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Details 詳細情報について
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- CRID
- 1360566399843620864
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- NII Article ID
- 210000145762
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
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- Data Source
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- Crossref
- CiNii Articles