Effects of final annealing in oxygen on characteristics of BaTiO3 thin films for resistance random access memory

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Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 54(10S), 10NA12-10NA12, 2015-09-18

    Japan Society of Applied Physics

Codes

  • NII Article ID (NAID)
    210000145773
  • ISSN
    0021-4922
  • Data Source
    Crossref 
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