Effects of final annealing in oxygen on characteristics of BaTiO₃ thin films for resistance random access memory

• Shuhei Hashimoto

• Toshiyuki Sugie

• Ziyang Zhang

• Kaoru Yamashita

• Minoru Noda

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 54 (10S), 10NA12-, 2015-09-18

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360566399843625728
• NII Article ID: 210000145773
• DOI: 10.7567/jjap.54.10na12
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/54/i=10S/a=10NA12/pdf
• Web Site: http://stacks.iop.org/1347-4065/54/i=10S/a=10NA12?key=crossref.c35339d1b368276905d9f37c1701d89b
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN