Surface thermal stability of free-standing GaN substrates
Abstract
<jats:title>Abstract</jats:title> <jats:p>The thermal stability of GaN surfaces was investigated with respect to homo-epitaxy on free-standing GaN substrates. Morphologies and etching rates of the GaN surfaces for free-standing polar (0001), nonpolar <jats:inline-formula> <jats:tex-math><?CDATA $(10\bar{1}0)$?></jats:tex-math> <jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="PL15136if001.gif" xlink:type="simple" /> </jats:inline-formula>, and semipolar <jats:inline-formula> <jats:tex-math><?CDATA $(20\bar{2}1)$?></jats:tex-math> <jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="PL15136if002.gif" xlink:type="simple" /> </jats:inline-formula> and <jats:inline-formula> <jats:tex-math><?CDATA $(20\bar{2}\bar{1})$?></jats:tex-math> <jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="PL15136if003.gif" xlink:type="simple" /> </jats:inline-formula> planes were studied before and after thermal cleaning. In the case of the polar (0001) plane, polishing scratches disappeared after thermal cleaning at temperatures above 1000 °C. The surface morphology depended on not only the cleaning temperature, but also the substrate off-angle. The surface after thermal cleaning became rough for the substrate with off-angle less than 0.05°. In the case of nonpolar and semipolar planes after thermal cleaning, surface morphologies and etching rates were strongly dependent on the planes. A flat surface was maintained at cleaning temperatures up to 1100 °C for the <jats:inline-formula> <jats:tex-math><?CDATA $(10\bar{1}0)$?></jats:tex-math> <jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="PL15136if004.gif" xlink:type="simple" /> </jats:inline-formula> plane, but the surface of the <jats:inline-formula> <jats:tex-math><?CDATA $(20\bar{2}1)$?></jats:tex-math> <jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="PL15136if005.gif" xlink:type="simple" /> </jats:inline-formula> plane became rough with increasing cleaning temperature.</jats:p>
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 55 (1S), 01AC08-, 2015-12-22
IOP Publishing
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Details 詳細情報について
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- CRID
- 1360284924866994944
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- NII Article ID
- 210000145956
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- ISSN
- 13474065
- 00214922
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- Data Source
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- Crossref
- CiNii Articles
- KAKEN