Metal–insulator transition of valence-controlled VO2thin film prepared by RF magnetron sputtering using oxygen radical 2016-05-17

Access this Article

Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 55(6S1), 06GJ11-06GJ11, 2016-05-17

    Japan Society of Applied Physics

Codes

  • NII Article ID (NAID)
    210000146653
  • ISSN
    0021-4922
  • Data Source
    Crossref 
Page Top