Advanced capacitor technology based on two-dimensional nanosheets

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<jats:title>Abstract</jats:title> <jats:p>As electronics continue to decrease in size, new classes of materials are necessary to continue this downsizing trend. Of particular importance is the development of high-performance capacitors based on dielectric films. Ultrathin high-<jats:italic>k</jats:italic> dielectrics are expected to be key to future applications. Recently, we have developed new high-<jats:italic>k</jats:italic> nanodielectrics based on molecularly thin oxide nanosheets [Ti<jats:sub>0.87</jats:sub>O<jats:sub>2</jats:sub>, Ti<jats:sub>2</jats:sub>NbO<jats:sub>7</jats:sub>, (Ca,Sr)<jats:sub>2</jats:sub>Nb<jats:sub>3</jats:sub>O<jats:sub>10</jats:sub>]. Newly developed nanosheets exhibited the highest permittivity (ε<jats:sub>r</jats:sub> > 100) ever realized in all known dielectrics in the ultrathin region (<10 nm). In this review, we present recent progress in dielectric nanosheets, highlighting emerging functionalities in capacitor applications.</jats:p>

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