Wet chemical preparation and isotope exchange process of H/D-terminated Si(111) and Si(110) studied by adsorbate vibrational analysis

• Erina Kawamoto

• Jungmin Kang

• Takuya Matsuda

• Taro Yamada

• Shozo Suto

Abstract

A convenient procedure for preparing D-terminated Si(111)-(1×1) and Si(110)-(1×1) by wet chemical etching was developed and applied to the vibrational analysis of these surfaces by high-resolution electron-energy loss spectroscopy (HREELS). Fully H-terminated Si(111)/(110) was first prepared in regular 40% NH 4 F/H 2 O solution, followed by immersion in saturated KF/D 2 O solution. HREELS revealed partially D-terminated H:Si(111)/(110) with the amount of deuterium termination depending on the immersion time. A series of various immersion times revealed the H/D exchange reaction kinetics, which are associated with the Si substrate etching processes on Si(111) (step-flow etching) and Si(110) (zipper reaction). The H–Si and D–Si stretching vibration frequencies as functions of the surface D fraction did not appear to change on Si(111), but on Si(110) the H–Si signal red shifted at a high D fraction. This is due to the adsorbate–adsorbate interaction, which is more intense on Si(110) because of the short nearest-neighbor distance of the adsorbates.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 56 (2), 025701-, 2017-01-12

  IOP Publishing

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1360284924867624192
• NII Article ID: 210000147440
• DOI: 10.7567/jjap.56.025701
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/56/i=2/a=025701/pdf
• Web Site: http://stacks.iop.org/1347-4065/56/i=2/a=025701?key=crossref.44c3fe978d3c40aff270de38b39f3e44
• Web Site: https://iopscience.iop.org/article/10.7567/JJAP.56.025701
• Web Site: https://iopscience.iop.org/article/10.7567/JJAP.56.025701/pdf
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