Silica imprint templates with concave patterns from single-digit nanometers fabricated by electron beam lithography involving argon ion beam milling

• Shunya Ito

• Eri Kikuchi

• Masahiko Watanabe

• Yoshinari Sugiyama

• Yoshiaki Kanamori

• Masaru Nakagawa

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 56 (6S1), 06GL01-, 2017-04-26

  IOP Publishing

キーワード

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

詳細情報

• CRID: 1360003449891139072
• NII論文ID: 210000147918
• DOI: 10.7567/jjap.56.06gl01
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/56/i=6S1/a=06GL01/pdf
• Web Site: http://stacks.iop.org/1347-4065/56/i=6S1/a=06GL01?key=crossref.8a15f98f8e2c3f40a7b4389827d2b7c4
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