An evaluation method of the profile of plasma-induced defects based on capacitance–voltage measurement

• Yukimasa Okada

• Kouichi Ono

• Koji Eriguchi

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 56 (6S2), 06HD04-, 2017-05-31

  IOP Publishing

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1360284924867867392
• NII Article ID: 210000147963
• DOI: 10.7567/jjap.56.06hd04
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/56/i=6S2/a=06HD04/pdf
• Web Site: http://stacks.iop.org/1347-4065/56/i=6S2/a=06HD04?key=crossref.80f4787edf3507722275ac22e1190904
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN