Generation of ultra high-power thermal plasma jet and its application to crystallization of amorphous silicon films

• Ryosuke Nakashima

• Ryota Shin

• Hiroaki Hanafusa

• Seiichiro Higashi

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 56 (6S2), 06HE05-, 2017-05-16

  IOP Publishing

キーワード

• General Physics and Astronomy
• General Engineering

詳細情報

• CRID: 1360566399844580096
• NII論文ID: 210000147968
• DOI: 10.7567/jjap.56.06he05
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/56/i=6S2/a=06HE05/pdf
• Web Site: http://stacks.iop.org/1347-4065/56/i=6S2/a=06HE05?key=crossref.c8f7f7dbbf43fb93b6cc99a8056b3784
• データソース種別:
  • Crossref
  • CiNii Articles
  • KAKEN