Chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant

• Hirofumi Matsuoka

• Kaito Kanahashi

• Naoki Tanaka

• Yoshiaki Shoji

• Lain-Jong Li

• Jiang Pu

• Hiroshi Ito

• Hiromichi Ohta

• Takanori Fukushima

• Taishi Takenobu

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 57 (2S2), 02CB15-, 2018-01-18

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360002221359587072
• NII Article ID: 210000148662
• DOI: 10.7567/jjap.57.02cb15
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/57/i=2S2/a=02CB15/pdf
• Web Site: http://stacks.iop.org/1347-4065/57/i=2S2/a=02CB15?key=crossref.9e79a78998827e8d3b227898a53166d8
• Data Source:
  • Crossref
  • CiNii Articles
  • KAKEN