Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 57 (6S1), 06HG01-, 2018-05-02
IOP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360284924868402304
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- NII論文ID
- 210000149169
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- ISSN
- 13474065
- 00214922
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- データソース種別
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- Crossref
- CiNii Articles
- KAKEN