Crystallization behavior and ferroelectric property of HfO₂–ZrO₂ films fabricated by chemical solution deposition

• Shuhei Nakayama

• Hiroshi Funakubo

• Hiroshi Uchida

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 57 (11S), 11UF06-, 2018-09-13

  IOP Publishing

キーワード

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

詳細情報

• CRID: 1360847874822120960
• NII論文ID: 210000149815
• DOI: 10.7567/jjap.57.11uf06
• ISSN: 13474065
• ISSN: 00214922
• Web Site: http://stacks.iop.org/1347-4065/57/i=11S/a=11UF06/pdf
• Web Site: http://stacks.iop.org/1347-4065/57/i=11S/a=11UF06?key=crossref.5a2bdb1c18404fe4b199f35f9581917e
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  • CiNii Articles
  • KAKEN