Effect of additives on preparation of vertical holes in Si substrate using metal-assisted chemical etching

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Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 58(SD), SDDF06-SDDF06, 2019-05-16

    IOP Publishing

Codes

  • NII Article ID (NAID)
    210000156072
  • ISSN
    0021-4922
  • Data Source
    Crossref 
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