Fabrication and Investigation of Carbon Nanotube Transistor by the Dip Coat Method
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- KAZUNORI ICHIKAWA
- Kobe City College of Technology Japan
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- AKIRA MATSUBARA
- Kobe City College of Technology Japan
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- YOSHIYUKI SUDA
- Toyohashi University of Technology Japan
抄録
<jats:title>SUMMARY</jats:title><jats:p>We have proposed a convenient fabrication technique for a carbon nanotubes (CNTs) transistor. The dip coat method using a metallic solution was employed to deposit metal catalysts of CNTs on the source and drain electrodes on a SiO<jats:sub>2</jats:sub>‐coated Si substrate at a low temperature. This method does not require a vacuum system or a long process time. After fabricating the CNTs using chemical vapor deposition, we evaluated the morphology of the CNTs using scanning electron microscopy and their electrical properties as a CNT field effect transistor (FET). The CNTs formed bridges between the source and drain electrodes. The field effect mobility of the CNT‐FET was measured to be 3000 cm<jats:sup>2</jats:sup>/Vs based on the transfer curve. On the basis of the electrical properties, a CNT‐FET with high field effect mobility can be obtained.</jats:p>
収録刊行物
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- Electronics and Communications in Japan
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Electronics and Communications in Japan 99 (9), 79-84, 2016-08-12
Wiley
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キーワード
詳細情報 詳細情報について
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- CRID
- 1360848655022551680
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- NII論文ID
- 210000163061
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- ISSN
- 19429541
- 19429533
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