Suppression of Ge surface segregation during Si molecular beam epitaxy by atomic and molecular hydrogen irradiation

• Kiyokazu Nakagawa

• Akio Nishida

• Yoshinobu Kimura

• Toshikazu Shimada

収録刊行物

• Journal of Crystal Growth

  Journal of Crystal Growth 150 939-943, 1995-05

  Elsevier BV

キーワード

• Materials Chemistry
• Inorganic Chemistry
• Condensed Matter Physics

詳細情報

• CRID: 1360016869737125760
• NII論文ID: 30004635343
• DOI: 10.1016/0022-0248(95)80078-q
• ISSN: 00220248
• Web Site: https://api.elsevier.com/content/article/PII:002202489580078Q?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:002202489580078Q?httpAccept=text/plain
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