Highly anisotropic silicon and polysilicon room-temperature etching using fluorine-based high density plasmas

• A. Tserepi

• E. Gogolides

• C. Cardinaud

• L. Rolland

• G. Turban

収録刊行物

• Microelectronic Engineering

  Microelectronic Engineering 41-42 411-414, 1998-03

  Elsevier BV

キーワード

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Atomic and Molecular Physics, and Optics
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1360298341408530560
• NII論文ID: 30005463141
• DOI: 10.1016/s0167-9317(98)00095-1
• ISSN: 01679317
• Web Site: https://api.elsevier.com/content/article/PII:S0167931798000951?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:S0167931798000951?httpAccept=text/plain
• データソース種別:
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  • CiNii Articles