Investigation of ion transportation in high-aspect-ratio holes from fluorocarbon plasma for SiO2 etching

• Shuichi Noda

• Nobuo Ozawa

• Takashi Kinoshita

• Hideo Tsuboi

• Kenji Kawashima

• Yukinobu Hikosaka

• Keizo Kinoshita

• Makoto Sekine

収録刊行物

• Thin Solid Films

  Thin Solid Films 374 (2), 181-189, 2000-10

  Elsevier BV

キーワード

• Materials Chemistry
• Metals and Alloys
• Surfaces, Coatings and Films
• Surfaces and Interfaces
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1364233270919426304
• NII論文ID: 30006174079
• DOI: 10.1016/s0040-6090(00)01150-0
• ISSN: 00406090
• Web Site: https://api.elsevier.com/content/article/PII:S0040609000011500?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:S0040609000011500?httpAccept=text/plain
• データソース種別:
  • Crossref
  • CiNii Articles