Very High Yield Growth of Vertically Aligned Single-Walled Carbon Nanotubes by Point-Arc Microwave Plasma CVD

• G. F. Zhong

• T. Iwasaki

• K. Honda

• Y. Furukawa

• I. Ohdomari

• H. Kawarada

収録刊行物

• Chemical Vapor Deposition

  Chemical Vapor Deposition 11 (3), 127-130, 2005-03

  Wiley

キーワード

• Process Chemistry and Technology
• Surfaces and Interfaces
• General Chemistry

詳細情報

• CRID: 1363388845144436992
• NII論文ID: 30008059646
• DOI: 10.1002/cvde.200404197
• ISSN: 15213862
• ISSN: 09481907
• Web Site: https://api.wiley.com/onlinelibrary/tdm/v1/articles/10.1002%2Fcvde.200404197
• Web Site: https://onlinelibrary.wiley.com/doi/full/10.1002/cvde.200404197
• データソース種別:
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  • CiNii Articles