Electron-diffraction channeling effect on defect formation in Si with <110> zone-axis incidence.

• TAKEDA S.

収録刊行物

• Ultramicroscopy

  Ultramicroscopy 56 144-162, 1994

詳細情報

• CRID: 1572261551088343168
• NII論文ID: 30008698330
• DOI: 10.1016/0304-3991(94)90154-6
• データソース種別:
  • CiNii Articles