プラズマプロセスによるカーボンナノチューブ配向成長の現状と課題  3.誘導結合RFプラズマCVD法によるカーボンナノチューブ配向成長

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タイトル別名
  • Synthesis of Aligned Carbon Nanotubes by Inductively Coupled Plasma Chemical Vapor Deposition
  • 誘導結合RFプラズマCVD法によるカーボンナノチューブ配向成長
  • ユウドウ ケツゴウ RF プラズマ CVDホウ ニ ヨル カーボンナノチューブハイコウ セイチョウ

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Inductively coupled plasma chemical vapor deposition combined with substrate biasing using a gas mixture of methane and hydrogen was applied to low-temperature synthesis of aligned carbon nanotubes and nanofibers. We found that the resultant carbon nanotubes, which were grown at 500°C, were aligned perpendicular to the substrate, and the aligned carbon nanofibers were synthesized even at a growth temperature as low as 200°C. The growth mechanism of the aligned carbon nanotubes and carbon nanofibers is discussed in terms of the moderate etching of carbon deposit by hydrogen species in inductively coupled plasma.

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