Nanometric patterning of zinc by optical near‐field photochemical vapour deposition

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Abstract

<jats:p>A new technique, optical near‐field photochemical vapour deposition (NFO‐PCVD) enables maskless production of nanometric structures with controllable size, chemical composition and morphology. By placing a near‐field optical microscope inside the reaction chamber for photochemical vapour deposition we have deposited nanoscale metal patterns. We demonstrate for the first time, successfully deposited in the near‐field region, lines of metallic zinc with the observed stripe width of 20 nm.</jats:p>

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