Photodeposition of Ti and application to direct writing of Ti:LiNbO3 waveguides

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  • J. Y. Tsao
    Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
  • R. A. Becker
    Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
  • D. J. Ehrlich
    Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
  • F. J. Leonberger
    Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173

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<jats:p>An ultraviolet laser photodeposition process based on the photolysis of TiCl4 has been developed. The photochemistry of this new metal-halide system has been shown to involve a surface-catalyzed reaction confined to adsorbed molecular layers. By using this process, Ti films have been deposited on LiNbO3 to form, after diffusion, 4-μm-wide single-mode channel waveguides of comparable quality to conventionally fabricated Ti-indiffused guides. The technique introduces new design flexibility into waveguide fabrication, permitting controlled gradations in the diffused index change and the lateral width along the guide.</jats:p>

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