Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers

• H. Seidel

  Messerschmitt‐Bölkow‐Blohm GmbH, D‐8000 Munich 80, Germany

• L. Csepregi

  Messerschmitt‐Bölkow‐Blohm GmbH, D‐8000 Munich 80, Germany

• A. Heuberger

  Messerschmitt‐Bölkow‐Blohm GmbH, D‐8000 Munich 80, Germany

• H. Baumgärtel

  Messerschmitt‐Bölkow‐Blohm GmbH, D‐8000 Munich 80, Germany

収録刊行物

• Journal of The Electrochemical Society

  Journal of The Electrochemical Society 137 (11), 3612-3626, 1990-11-01

  The Electrochemical Society

キーワード

• Materials Chemistry
• Electrochemistry
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Renewable Energy, Sustainability and the Environment
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1361137044909178368
• NII論文ID: 30016156183
• DOI: 10.1149/1.2086277
• ISSN: 19457111
• ISSN: 00134651
• Web Site: https://iopscience.iop.org/article/10.1149/1.2086277
• Web Site: https://iopscience.iop.org/article/10.1149/1.2086277/pdf
• データソース種別:
  • Crossref
  • CiNii Articles