Ultrathin Ta2 O 5 Film Capacitor with Ru Bottom Electrode

• Tomonori Aoyama

  Toshiba Corporation, Microelectronics Engineering Laboratory, ULSI Process Engineering Laboratory, Yokohama 235‐8522, Japan

• Soichi Yamazaki

  Toshiba Corporation, Microelectronics Engineering Laboratory, ULSI Process Engineering Laboratory, Yokohama 235‐8522, Japan

• Keitaro Imai

  Toshiba Corporation, Microelectronics Engineering Laboratory, ULSI Process Engineering Laboratory, Yokohama 235‐8522, Japan

収録刊行物

• Journal of The Electrochemical Society

  Journal of The Electrochemical Society 145 (8), 2961-2964, 1998-08-01

  The Electrochemical Society

キーワード

• Materials Chemistry
• Electrochemistry
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Renewable Energy, Sustainability and the Environment
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1360016868623335424
• NII論文ID: 30016166959
• NII書誌ID: AA00697016
• DOI: 10.1149/1.1838745
• ISSN: 19457111
• ISSN: 00134651
• Web Site: https://iopscience.iop.org/article/10.1149/1.1838745
• Web Site: https://iopscience.iop.org/article/10.1149/1.1838745/pdf
• データソース種別:
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  • CiNii Articles