Graded TiN Coating by Supersonic Free-Jet PVD Combined with Reactive Plasma
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- Yumoto Atsushi
- Department of Mechanical Systems Engineering, Faculty of Engineering, Kogakuin University
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- Yamamoto Takahisa
- Department of Advanced Materials Science, Graduate School of Frontier Sciences, University of Tokyo
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- Hiroki Fujio
- Department of Mechanical Systems Engineering, Faculty of Engineering, Kogakuin University
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- Shiota Ichiro
- Department of Materials Science and Technology, Faculty of Engineering, Kogakuin University
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- Niwa Naotake
- Department of Mechanical Systems Engineering, Faculty of Engineering, Kogakuin University
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Ceramic coating is a very popular technology for improving the properties of structural materials. A titanium nitride (TiN) coating is a typical example and has been widely applied to cutting tools, electronic devices and many other fields utilizing its superior physical properties. This paper sought to produce a graded TiN coating on a Ti substrate by combining Supersonic Free-Jet PVD (SFJ-PVD) with a reactive plasma-metal reaction technique. The authors have developed SFJ-PVD as a new coating method in which a coating film is formed by depositing nanoparticles with very high velocity onto a substrate. SFJ-PVD can provide a high deposition rate and thick film coating. Gradually changing the nitrogen flow rate during deposition produces a graded TiN coating, in which composition changes gradually from pure Ti to TiN . A monolithic TiN coating is also produced with SFJ-PVD . XRD analysis of the graded TiN detected peaks for Ti, Ti2N and TiN, while only a TiN peak is observed in the monolithic TiN coating. EPMA analysis of a graded coating reveals a gradual compositional change from pure Ti to TiN . Few pores or cracks are observed in a graded TiN or in a monolithic TiN formed under the optimized conditions of SFJ-PVD.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 43 (11), 2932-2934, 2002
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204246338048
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- NII論文ID
- 130004451747
- 10012328555
- 30018850789
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- NII書誌ID
- AA1151294X
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- COI
- 1:CAS:528:DC%2BD3sXjtFOi
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 6367699
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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