Microscopic mechanism of atomic diffusion in Si under pressure

• Osamu Sugino

• Atsushi Oshiyama

収録刊行物

• Physical Review B

  Physical Review B 46 (19), 12335-12341, 1992-11-15

  American Physical Society (APS)

詳細情報

• CRID: 1360292619097274752
• NII論文ID: 30019055693
• NII書誌ID: AA00773566
• DOI: 10.1103/physrevb.46.12335
• ISSN: 10953795
• ISSN: 01631829
• Web Site: http://link.aps.org/article/10.1103/PhysRevB.46.12335
• Web Site: http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.46.12335/fulltext
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