Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator
-
- J. Hopwood
- Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115
-
- O. Minayeva
- Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115
-
- Y. Yin
- Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115
抄録
<jats:p>The electron temperature and ion density produced by a microfabricated plasma generator are characterized in both argon gas and air. The plasma generator sustains a discharge by inductively coupling 450 MHz rf power into a small (10 mm diameter) vacuum chamber. The inductively coupled plasma source is surface micromachined on a glass wafer by electroplating a planar spiral inductor and two interdigitated capacitors. A plasma can be sustained using gas pressures between 0.1 and 10 Torr and rf powers between 0.3 and 3 W. The ion density increases from 1010 to 1011 cm−3 over this range of power. The electron temperature decreases from 4 to 2 eV as the pressure increases from 0.1 to 1 Torr.</jats:p>
収録刊行物
-
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
-
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 18 (5), 2446-2451, 2000-09-01
American Vacuum Society
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1362544420432978304
-
- NII論文ID
- 30020315799
-
- ISSN
- 15208567
- 10711023
-
- データソース種別
-
- Crossref
- CiNii Articles