Elasticity, wear, and friction properties of thin organic films observed with atomic force microscopy
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- R. M. Overney
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- T. Bonner
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- E. Meyer
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- M. Rüetschi
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- R. Lüthi
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- L. Howald
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- J. Frommer
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- H.-J. Güntherodt
- Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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- M. Fujihira
- Department of Bimolecular Engineering, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 227, Japan
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- H. Takano
- Department of Bimolecular Engineering, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 227, Japan
Abstract
<jats:p>An atomic force microscopy study is presented on lubricating systems, such as thin organic Langmuir–Blodgett films. Local elastic compliance was measured simultaneously with topography and friction on thin films of mixtures of fluorocarbons and hydrocarbons. On the phase-separated fluorocarbon domains, higher friction and lower Young’s modulus than on the hydrocarbon domains was found. Adhesive wear has been observed to occur randomly on the stiffer hydrocarbon domains if the film is complexed with a counterion polymer of a larger cross-sectional area. A quantitative fractal analysis of the hydrocarbon film remaining areas provided a linear adhesive wear dependence on the scan cycle number.</jats:p>
Journal
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- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 12 (3), 1973-1976, 1994-05-01
American Vacuum Society
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Details 詳細情報について
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- CRID
- 1363388846230081024
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- NII Article ID
- 30020321577
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- DOI
- 10.1116/1.587682
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- ISSN
- 15208567
- 10711023
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- Data Source
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- Crossref
- CiNii Articles