Three-Dimensional Simulation of Target Erosion in DC Magnetron Sputtering.

• Shidoji Eiji

  Research Center, Asahi Glass Co., Ltd., 1150 Hazawa–cho, Kanagawa–ku, Yokohama 221

• Nemoto Masaharu

  Research Center, Asahi Glass Co., Ltd., 1150 Hazawa–cho, Kanagawa–ku, Yokohama 221

• Nomura Takuji

  Research Center, Asahi Glass Co., Ltd., 1150 Hazawa–cho, Kanagawa–ku, Yokohama 221

• Yoshikawa Yukio

  Research Center, Asahi Glass Co., Ltd., 1150 Hazawa–cho, Kanagawa–ku, Yokohama 221

抄録

We simulate the erosion profiles of a rectangular planar target in the DC magnetron sputtering system. The simulation model assumes time-independent magnetic and electric fields that are not disturbed by the magnetron plasma. The electron trajectories are obtained by integrating partial orbits. The Monte Carlo technique, taking account of the differential cross section, is used to discriminate the ionization collision from the excitation and elastic collisions. Thus we determine the coordinates where an argon ion and an electron appear to indicate the erosion profiles. The calculated 3D erosion profiles are in very good agreement with those of the target actually used. This simulation technique for the sputtering process will be valuable in designing the magnet arrangement of a magnetron sputter target.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 33 (7B), 4281-4284, 1994

  The Japan Society of Applied Physics

キーワード

• magnetron sputtering
• Monte Carlo method
• simulation
• cross section
• target erosion
• ionization collision
• plasma

詳細情報

• CRID: 1390282681221734656
• NII論文ID: 210000035744
• NII論文ID: 30021820301
• NII論文ID: 130004520426
• NII書誌ID: AA10457675
• DOI: 10.1143/jjap.33.4281
• ISSN: 13474065
• ISSN: 00214922
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.33.4281
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.33.4281/pdf
• 本文言語コード: en
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可