Laser Ablation of Transparent Materials by UV fs-Laser Irradiation.

• Niino Hiroyuki

  Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technology (AIST)

• Yabe Akira

  Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technology (AIST)

抄録

We have investigated the laser ablation of UV transparent materials of PTFE, FEP, quartz and sapphire with a femtosecond-pulsed UV laser at the wavelength of 268nm. Upon laser irradiation, a fine etching without debris was obtained on the surfaces of PTFE and quartz. The laser-ablated surfaces were analyzed by optical microscopy. The ablation mechanism is discussed in terms of multi-photon absorption and thermal diffusion induced by a ultra-short pulse of the laser.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 14 (2), 197-202, 2001

  フォトポリマー学会

キーワード

• UV fs-laser ablation
• surface microstructuring
• transparent materials

詳細情報

• CRID: 1390001204325793536
• NII論文ID: 130003488372
• NII論文ID: 40005352026
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.14.197
• COI: 1:CAS:528:DC%2BD3MXmt1Wntbg%3D
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 5833286
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5833286
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer1988/14/2/14_2_197/_pdf
• 本文言語コード: en
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可