Thermally Stable Polyarylenes with Low Dielectric Constant: Direction towards the Lowest Limit of Dielectrics.
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- Goto Kohei
- Tsukuba Research Laboratories, JSR Corporation
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- Akiike Toshiyuki
- Tsukuba Research Laboratories, JSR Corporation
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- Konno Keiji
- Tsukuba Research Laboratories, JSR Corporation
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- Shiba Tadahiro
- Tsukuba Research Laboratories, JSR Corporation
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- Patz Matthias
- Tsukuba Research Laboratories, JSR Corporation
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- Takahashi Masayuki
- Tsukuba Research Laboratories, JSR Corporation
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- Inoue Yasutake
- Tsukuba Research Laboratories, JSR Corporation
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- Matsubara Minoru
- Tsukuba Research Laboratories, JSR Corporation
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抄録
We successfully prepared a series of soluble, thermally stable Polyarylenes with low dielectric constant (k) by coupling polymerization of aromatic dihalides and/or bismesylates of the corresponding bisphenols using Zn and Ni-phosphine catalysts. Among the non-fluorinated polyarylenes, a soluble copolyarylene derived from bismesylates of 9, 9-bis(4-hydroxyphenyl)fluorene and 4, 4′-dihydroxyphenyl-diphenylmethane showed with k=2.7 (@1MHz), Tg:>300°C, and Td (5%, N2):549°C the lowest k value. The polyarylene with the lowest k, a fluorinated polymer prepared from the bismesylate of 2, 2-bis-(4-hydroxyphenyl)hexafluoropropane, showed k=2.2 (@1MHz), Tg:249°C and Td (5%, N2):508°C. Among organic polymers, soluble polyarylenes proved to be very promising as low k materials with high thermal stability. In addition, we show based on these new results and previous results with fluorenyliden-substituted polyimides how to estimate the dielectric constant in polyimides and polyarylenes as a function of polar linkage (imide) concentration and fluorine content.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 15 (2), 223-229, 2002
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詳細情報 詳細情報について
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- CRID
- 1390001204325312512
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- NII論文ID
- 130003488456
- 40005587688
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD38XmtlehtLY%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 6219631
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可