High speed deposition of Y2O3 films by laser-assisted chemical vapor deposition

• Banal Ryan

  Institute for Materials Research, Tohoku University

• Kimura Teiichi

  Institute for Materials Research, Tohoku University

• Goto Takashi

  Institute for Materials Research, Tohoku University

書誌事項

タイトル別名

• High Speed Deposition of Y<SUB>2</SUB>O<SUB>3</SUB> Films by Laser-Assisted Chemical Vapor Deposition

抄録

Thick yttria (Y₂O₃) films were synthesized at high speeds by laser-assisted chemical vapor deposition (LCVD) using an Y(dpm)₃ (dpm = dipivaloylmethanate) precursor. The effects of deposition conditions on the deposition rate and their microstructure were investigated. While the deposition rate was less than a few microns per hour at low laser powers (P_L) less than 100 W, significantly high deposition rates of more than 200 μm/h (56 nm/s) were obtained at P_L more than 160 W. The highest deposition rate in this study was 300 μm/h (83 nm/s) being 100 to 1000 times greater than those of conventional CVD processes. Deposited films were dense and isotropic with no preferred orientation showing cauliflower-like microstructure.

収録刊行物

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 46 (9), 2114-2116, 2005

  公益社団法人 日本金属学会

キーワード

• laser chemical vapor deposition
• deposition rate
• Y<SUB>2</SUB>O<SUB>3</SUB> film
• Y(dpm)<SUB>3</SUB>
• cauliflower-like microstructure

詳細情報

• CRID: 1390282679227191040
• NII論文ID: 130004452903
• NII論文ID: 40006876272
• NII書誌ID: AA1151294X
• DOI: 10.2320/matertrans.46.2114
• ISSN: 13475320
• ISSN: 13459678
• HANDLE: 10097/52305
• NDL書誌ID: 7439372
• Web Site: https://tohoku.repo.nii.ac.jp/records/44233
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7439372
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/46/9/46_9_2114/_pdf
• 本文言語コード: en
• データソース種別:
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