Novel Back End-of-Line Process Scheme for Improvement of Negative Bias Temperature Instability Lifetime

• Won-Joon Ho

• Sung-Hyung Park

• Dong-Sun Kim

書誌事項

タイトル別名

• Novel Back End of Line Process Scheme for Improvement of Negative Bias Temperature Instability Lifetime

抄録

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

収録刊行物

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 45 (4A), 2455-2458, 2006-04

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

キーワード

• NBTI
• passivation layer
• BEOL process
• hot carrier

詳細情報

• CRID: 1520853833450955648
• NII論文ID: 40007227449
• NII書誌ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.45.2455
• NDL書誌ID: 7882327
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7882327
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.45.2455
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.45.2455/pdf
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • Crossref
  • CiNii Articles