Surface Property Control for 193nm Immersion Resist

• Irie Makiko

  Advanced Material Development Division 1, TOKYO OHKA KOGYO CO., LTD.

• Endo Kotaro

  Advanced Material Development Division 1, TOKYO OHKA KOGYO CO., LTD.

• Iwai Takeshi

  Advanced Material Development Division 1, TOKYO OHKA KOGYO CO., LTD.

Abstract

The surface property of the resist film is critical for photoresist processing especially for immersion lithography. To control the interaction between resist film and water fluid, the polymer blend between the conventional acryl polymer and the fluorine-containing homo-polymer are examined. The polymer blend successfully modifies the film surface as verified by the dynamic contact angle measurement. The distribution of the blend polymer in the film gives an impact to the surface property. The surface can be also controlled by the use of blended polymer without any impact on the pattern profile at 193nm dry exposure. However, the optimization in resist formulation is necessary to achieve both the hydrophobic surface and imaging performance for a topcoat-less resist processing.

Journal

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 19 (4), 565-568, 2006

  The Society of Photopolymer Science and Technology(SPST)

Keywords

• immersion lithography
• polymer blend
• fluorine containing
• contact angle

Details

• CRID: 1390282679302823808
• NII Article ID: 130004833135
• NII Article ID: 40007307386
• NII Book ID: AA11576862
• DOI: 10.2494/photopolymer.19.565
• COI: 1:CAS:528:DC%2BD28XotVCgsb4%3D
• ISSN: 13496336
• ISSN: 09149244
• NDL BIB ID: 7955181
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7955181
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer/19/4/19_4_565/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed